Title page for etd-0815108-145431


[Back to Results | New Search]

URN etd-0815108-145431
Author Chen-Yi Fan
Author's Email Address No Public.
Statistics This thesis had been viewed 5342 times. Download 5015 times.
Department Mechanical and Electro-Mechanical Engineering
Year 2007
Semester 2
Degree Master
Type of Document
Language zh-TW.Big5 Chinese
Title Study of nanoimprint process by quartz glass mold
Date of Defense 2008-07-17
Page Count 107
Keyword
  • Quartz Glass
  • Nanoimprint
  • Nanofabrication
  • Filling Rate
  • Abstract This study investigates sub 200nm half-pitch polymer structures by nanoimprint process. The trench structures were fabricated on quartz glass with various depths and widths by FIB. To investigate the best nanoimprint process on SU-8, we studied various parameters such as: imprinting temperature, imprinting pressure, and temperature for de-molding, etc.  This study had successfully defined 50nm width with different depths on to SU-8 by imprint.  Imprint temperature above Tg 30℃ with constant pressure on continuous impressing and de-mold in room temperature would result in better imprinting results. The filling rate of this nanoimprint technology was measured by atomic force microscopy.  For structures above/near 100nm half-pitch, the filling rate is nearly 100%.
    Advisory Committee
  • Lee, Ming-San - chair
  • Pan, Cheng-Tang - co-chair
  • Tsai, Nan-Chyuan - co-chair
  • Chao,Chien-Hsiang - advisor
  • Files
  • etd-0815108-145431.pdf
  • indicate accessible in a year
    Date of Submission 2008-08-15

    [Back to Results | New Search]


    Browse | Search All Available ETDs

    If you have more questions or technical problems, please contact eThesys