Title page for etd-0805109-221633


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URN etd-0805109-221633
Author Che-Yang Chang
Author's Email Address No Public.
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Department Electrical Engineering
Year 2008
Semester 2
Degree Master
Type of Document
Language English
Title Electrochromic Properties of Tungsten Oxide Films Prepared by RF Sputtering and Liquid Phase Deposition
Date of Defense 2009-07-21
Page Count 99
Keyword
  • RF sputtering
  • LPD
  • WO3
  • electrochromic
  • Abstract Tungsten trioxide (WO3) films are important for various optical devices and
    especially for electrochromic materials. Sputtered WO3 thin films were deposited on
    conductive glass substrate (ITO/glass) by RF sputtering from a WO3 target(diameter
    2”x 6 mm) in a reactive atmosphere of oxygen and argon flow ratio(0 to 1) mixture in
    a total gas pressure of 10m Torr. The RF power was 100W operating at 13.56MHz.We
    will improve the WO3 films by post-annealing in different atmosphere ambient.
    In addition, to prepare treatment solution of growing WO3 films were dissolved
    tungsten to aqueous which mixed hydrofluoric acid and nitric acid until it
    supersaturate. This solution was then diluted to 0.02 M of tungsten ions with distilled
    water. And we can get the treatment solution (WO3-HF aqueous). The WO3 thin films
    have been deposited at 40oC with the treatment solution (WO3-HF aqueous) which
    full of W ions, the 0.1M boric acid (H3BO3) solution and added aluminium metal by
    liquid phase deposition (LPD) technique. The deposition rate could be controlled to
    45 nm/h.
    In our experiment, the WO3 films morphology and thickness was characterized
    by scanning electron microscopy(SEM), structure was characterized by X-ray
    diffraction(XRD), chemical properties was characterized by X-ray photoelectron
    spectroscopy(XPS) and Fourier transform infrared spectroscopy(FT-IR), optical
    properties was characterized by spectrophotometer(MP-100M), and electrochromic
    characterized by cyclic voltammetry(CHI627C).
    In our results, it will be improved the optical and electrochromic properties of
    sputtered-WO3 films by post-annealing in O2 ambient. we also have try a novel and
    very simple process for the thin films of WO3 by the LPD process. Adherent and
    conformal WO3 electrochromic films were prepared on ITO/glass from aqueous
    fluoride solution.
    Advisory Committee
  • Kuo-Mei Chen - chair
  • Tsu-Hsin Chang - co-chair
  • Jeng Gong - co-chair
  • Ming-Kwei Lee - advisor
  • Files
  • etd-0805109-221633.pdf
  • indicate accessible in a year
    Date of Submission 2009-08-05

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