Title page for etd-0725112-154115


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URN etd-0725112-154115
Author Yen-Ting Lai
Author's Email Address No Public.
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Department Electrical Engineering
Year 2011
Semester 2
Degree Master
Type of Document
Language English
Title Characterization of Transparent Conducting P-type Nickel Oxide Films on Glass Substrate Prepared by Liquid Phase Deposition
Date of Defense 2012-07-19
Page Count 78
Keyword
  • liquid phase deposition
  • doping
  • Nickel oxide
  • transmittance
  • resistivity
  • Transparent Conducting Oxides
  • Abstract In this study, the characteristics of LPD-NiO, and lithium-doped LPD-NiO filmson glass substrate were investigated. In our experiment, we do some measurement about physical, chemical, electrical and optical properties for LPD-NiO and lithium-doped LPD-NiO films and discussed with them. The NiO film thickness was characterized by field emission scanning electron microscopy (FE-SEM), structure was characterized by X-ray diffraction (XRD), chemical properties were characterized by X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FT-IR). Electrical properties were characterized by four-point probe, and optical properties were characterized by a reflecting spectrograph. The thermal annealing was used to improve the characteristics of LPD-NiO and lithium-doped LPD-NiO films in nitrogen, air and nitrous oxide ambient. For lithium doping, the lithium chloride was used as the doping solution and the electrical characteristics were enhanced. After thermal annealing in air at 400 oC, the resistivity of NiO films is 7.5 × 10-1 ohm-cm and can be lowed to 7.2 × 10-3 ohm-cm with lithium doping.
    Advisory Committee
  • Kuo-Mei Chen - chair
  • Su-Hua Yang - co-chair
  • Min-Yen Yeh - co-chair
  • Ming-Kwei Lee - advisor
  • Files
  • etd-0725112-154115.pdf
  • Indicate in-campus at 99 year and off-campus access at 99 year.
    Date of Submission 2012-07-25

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