Title page for etd-0710112-133127


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URN etd-0710112-133127
Author Chin-Ching Wu
Author's Email Address v1300167@hotmail.com
Statistics This thesis had been viewed 5576 times. Download 6416 times.
Department Electro-Optical Engineering
Year 2011
Semester 2
Degree Master
Type of Document
Language zh-TW.Big5 Chinese
Title Aluminum targets characterization and their thin films deposition
Date of Defense 2012-06-26
Page Count 45
Keyword
  • aluminum thin film
  • resistivity
  • roughness
  • magnetron sputtering
  • surface morphology
  • Abstract The purpose of this study is to investigate the effects on DC sputtered thin films after different surface treatments on aluminum targets. Abrasive papers and nonwovens were used to polish the aluminum targets before sputtering. Surface morphology of the aluminum targets before and during sputtering were characterized using surface profiler. In addition, the erosion rate of the aluminum targets was obtained by measuring the changes of the erosion depth with sputtering time at a fixed processing condition. On the other hand, the surface morphology and electrical characteristics of the deposited thin films with respect to different aluminum targets were investigated. We found that surface roughness of the treated aluminum targets is of great importance to the stability of the film quality.
    Advisory Committee
  • Ting-Chang Chang - chair
  • Chao-Kuei Lee - co-chair
  • Yi-Jen Chiu - co-chair
  • Ann-Kuo Chu - advisor
  • Files
  • etd-0710112-133127.pdf
  • indicate access worldwide
    Date of Submission 2012-07-10

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