Title page for etd-0704106-165132


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URN etd-0704106-165132
Author Shih-Chieh Lin
Author's Email Address No Public.
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Department Mechanical and Electro-Mechanical Engineering
Year 2005
Semester 2
Degree Master
Type of Document
Language zh-TW.Big5 Chinese
Title Applications of Electroless Plating and Electrophoretic to Glass Substrate Deposition
Date of Defense 2006-06-28
Page Count 67
Keyword
  • electroless plating
  • electrophoretic deposition
  • Abstract In this study we present the results of electroless deposition of silver (Ag) and electrophoretic deposition (EPD) of Al2O3 layers on glass for application in thin film transistor (TFT). Since Ag exhibits excellent resistivity, it is selected to be the material of conductive layer. Ag thin film electrical and physical parameters are studied as a function of the deposition time and working temperature. We study the thin-film electrical and mechanical properties using 4-point Probe, surface analyzer and nano indenter. The Ag film, thicker than 200 nm, exhibited a specific electrical sheet resistivity of about 500 mΩ/□. We also study the thin-film morphology and composition using SEM and FTIR, respectively. In this study, Mechanism and kinetics of the electrophoretic process in an Al2O3 cell are also studied. Al2O3 concentration levels are set from 1.25 to 7.5%, and deposition time from 5~20 seconds. Deposition time and Al2O3 particle concentration is experimentally discussed and characterized. The result shows that a linear relationship between the deposition rate and applied voltage is obtained. Besides, in this study, deposition of conductive layer silver and insulating layer Al2O3 for TFT are studied. A new process to deposit Ag layer and Al2O3 layer to be the conductivity layer and insulating layer of TFT is presented. First, the circuit pattern is defined by lithography process. Then, Ag is deposited with thickness of 200 nanometers. Second, the wafer is immersed in the stripper solution to remove the resist. After the deposition of the Ag on glass is finished, Al2O3 nano-scale particle concentration is prepared for electrophoretic deposition.
    Advisory Committee
  • Chi-Hui Chien - chair
  • Chien-Hsiang Chao - co-chair
  • Yeong-Maw Hwang - co-chair
  • Cheng-Tang Pan - advisor
  • Files
  • etd-0704106-165132.pdf
  • indicate accessible in a year
    Date of Submission 2006-07-04

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