Title page for etd-0703100-145204


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URN etd-0703100-145204
Author Te-Chung Wang
Author's Email Address m8731643@student.nsysu.edu.tw
Statistics This thesis had been viewed 5352 times. Download 2792 times.
Department Electrical Engineering
Year 1999
Semester 2
Degree Master
Type of Document
Language English
Title Study on the Buffer Layer and Recrystallization for the Growth of GaN by MOCVD
Date of Defense 2000-06-26
Page Count 79
Keyword
  • buffer layer
  • GaN
  • MOCVD
  • Abstract   The materials based on GaN have successfully developed on short-wavelength laser diodes (LDs), light-emitting diodes (LEDs) and ultraviolet photodetector. In this study, GaN epitaxial layers have been successfully grown on sapphire substrates. We used several methods including the nitridation temperature for substrates before growing epilayer, the growth temperature and time of buffer layer and the growth temperature of GaN epilayer to study it. From the results of the photoluminescence (PL) measured at 77K, the X-Ray diffraction measurement, SEM cross sectional views to realize the characteristic and we get a better qualities of GaN epilayers after using the foregoing methods. In this study, the re-crystallization of the buffer layer would occur while temperature re-rise to high temperature, and the phenomenon of conglomeration influence the quality and morphology of GaN epilayers. According to the results of the experiments, we study the mechanisms of yellows luminescence and donor-acceptor pair.
    Advisory Committee
  • Wen-Tai Lin - chair
  • Chung-Cheng Chang - co-chair
  • Wei-Chou Hsu - co-chair
  • Ming-Kwei Lee - advisor
  • Files
  • Study on the Buffer Layer and Recrystallization for the Growth of GaN .pdf
  • indicate access worldwide
    Date of Submission 2000-07-03

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