||In recent years, due to the rapid development of optoelectronic semiconductor material, it’s related research with applications is proposed, such as the main optoelectronic products of solar cells, flat-panel displays, light emitting devices and waveguide devices, etc. Conductivity and transparency are important considerations in the application of the optoelectronics. Since the glass is not conductive, so a good transparent conductive substrate material needs to be coated with the transparent conductive oxide.|
In this thesis, a 5.5-generation vertical MOCVD(Metal-Organic Chemical Vapor Deposition) coating equipment has been built in cooperation with the industrial manufacturers together. With the help of TwinCAT(The Windows Control And Automation Technology), DEZn and H2O as precursors, the MOCVD is automafed to deposite zinc oxide thin films on glass, to provide transparent conductive electrodes of ZnO to solar cell glass substrate.
Using the simulation software of COMSOL Multiphysics and 3D CAD program of Inventor the concentration, pressure and velocity distribution of precursors are analyzed various experimental parameters for the deposition rate and film uniformity. Appling MOCVD equipment the sample has been coated with ZnO and compared with simulation results. This work supplies a basic data and simulation to improve the process parameters of MOCVD.